Award-winning American photographer Pete Muller will lead an advanced photojournalism course in Singapore later this month.

The course is being hosted by WAMN-Ifra in conjunction with World Press Photo 15, on January 26-27.

Aim will be to impart both practical and conceptual
skills in modern photography, with participants learning to garner support from editorial and marketing teams by
refining story ideas and connecting them to the broader
trends in global discourse.

Participants will
produce a short project for peers and instructor review and
learn new perspectives on the evolving technical
landscape of digital media.

Muller is based in Nairobi, Kenya, and regularly contributes to The New York Times, The Washington Post, National Geographic Magazine and other leading photographic outlets.